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How to Become a User
Important Links
User Policies
Internal User Application
External User Application
User Fees Schedules
NanoFab Printable Brochure
SEM-FIB-Ebeam Writer Application
Equipment Contacts
Equipment Reservation and Status
Nano-MEMS Ph.D. Diagnostic Exam Information
 
ZEISS Supra 55 VP Scanning Electron Microscope

High performance variable pressure FE-SEM with patented GEMINI column technology
Schottky type field emission gun
Resolution

* 1.0nm @ 15kV

* 1.7nm @ 1kV at High Vacuum Mode (HV)

* 2.0nm @ 30kV at Variable Pressure Mode (VP)
Detectors

* Everhardt Thornley secondary electron detector

* Variable Pressure Secondary Electron (VPSE) detector for use at Variable Pressure Mode with realtime automatic contrast/brightness and manual override

* High efficiency in-lens SE-detector system with real time automatic contrast/brightness and manual override

* CCD-camera with IR-illumination

*Specimen current measurement
GENESIS 4000 XMS SYSTEM 60 ENERGY DISPERSIVE SPECTROMETER INCLUDING A SAPPHIRE DETECTOR WITH DIGITAL SIGNAL PROCESSING, XRAY MAPPING AND DIGITAL IMAGING FOR SEM
Electrical feed-throughs to study MEMs and NEMs devices.
Maximum wafer size: 8” diameter

All SEM Facilities
ZEISS Supra 55 VP Scanning Electron Microscope
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