A Focused Ion Beam system with Electron Beam and Ion Beam Lithography, and TEM sample preparation. A uniquely configured, very versatile research tool that designs, generates, analyzes and characterizes patterns for future nano devices.
Focused Ion Beam from Orsay Electronics – Gallium liquid metal ion source
Gas Injection System (GIS) for three gases

* SiO2 deposition

* W deposition

* Si, SiO2, and Si3N4 etching
Kleindiek manipulator for TEM sample preparation
GEMINI Electron Optical Column with Schottky type field emission gun
JC Nabity E-beam/ion-beam writing attachment
Maximum wafer size: 8” (4” through loadlock)