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How to Become a User
Important Links
User Policies
Internal User Application
External User Application
User Fees Schedules
NanoFab Printable Brochure
SEM-FIB-Ebeam Writer Application
Equipment Contacts
Equipment Reservation and Status
Nano-MEMS Ph.D. Diagnostic Exam Information
 
OAI Model806 manual Front/Backside Contact Mask Aligner

A 350W Near UV Exposure System
6’’ dia. uniform beam size
Intensity Controlling Power Supply System
Mask Alignment Module with wedge effect elimination
One Mask Holder for 5’’ X 5’’ masks
One planarizing Wafer Chuck for 4’’ dia. substrate with backside alignment
One (1) additional piece chuck (topside only)
Dual Camera CCTV Alignment System for top side contact alignment
Dual Camera Back Side Alignment Optics
Vibration Isolation Table

All Photolithography Facilities
• Blue_M IGP 6680 Inert Atmosphere Oven
• Chemical Hoods and Millipore DI Water System
• Karl Suss MA56 Contact Mask Aligner
• Nanonex NX-B200 Nano-Imprinter
• OAI Model806 manual Front/Backside Contact Mask Aligner
• Spinner Hood & Wafer Bake Hotplates
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