Facility

AJA ATC ORION Series Evaporation System

UHV linear E-beam source
Quartz Crystal Thickness Monitor
Substrate Holder with the following features:

*accommodates substrates up to 6’’ diameter

*continuous motorized rotation (0-20 RPM) with controller

*radiant heating to 850 °C with quartz halogen lamp for samples up to 4’’, 300 °C for samples 4’’ – 6’’

SUBSTRATE RF BIAS for PRE-CLEANING
Deposition Uniformity: better than +/- 2.5% over a 4” diameter wafer
Base Vacuum: better than or equal to 5.0×10-8 Torr
Pumpdown to 5×10-7 Torr in 30 minutes or less from clean dry and empty after N2 vent

 


All Deposition and Etching Facilities

• AJA ATC ORION Series Thermal Evaporation System
• AJA ATC ORION Series Evaporation System
• AJA ATC ORION Series UHV Sputtering System
• CHA Electron-Beam Evaporator
• Cressington Gold Sputtering Deposition
• Home-Built Sputter System
• KJL LAB 18 Sputtering
• Neocera Pulsed Laser Deposition Facilities
• Nickel Electroplating
• TRION ORION II PECVD/LPCVD System
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