Facility

AJA ATC ORION Series Evaporation System

UHV linear E-beam source
Quartz Crystal Thickness Monitor
Substrate Holder with the following features:

*accommodates substrates up to 6’’ diameter

*continuous motorized rotation (0-20 RPM) with controller

*radiant heating to 850 °C with quartz halogen lamp for samples up to 4’’, 300 °C for samples 4’’ – 6’’

SUBSTRATE RF BIAS for PRE-CLEANING
Deposition Uniformity: better than +/- 2.5% over a 4” diameter wafer
Base Vacuum: better than or equal to 5.0×10-8 Torr
Pumpdown to 5×10-7 Torr in 30 minutes or less from clean dry and empty after N2 vent

 


All Deposition and Etching Facilities

AJA ATC ORION Series Thermal Evaporation System
AJA ATC ORION Series Evaporation System
AJA ATC ORION Series UHV Sputtering System
CHA Electron-Beam Evaporator
Cressington Gold Sputtering Deposition
Home-Built Sputter System
KJL LAB 18 Sputtering
Neocera Pulsed Laser Deposition Facilities
Nickel Electroplating
TRION ORION II PECVD/LPCVD System
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