Conference 6462A
Monday and Wednesday 22-24 January
2007
Part of Proceedings of SPIE Vol. #6462
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Conference Chairs: Mary-Ann Maher, SoftMEMS;
Harold D. Stewart, Sandia National Labs.; Jung-Chih
Chiao, The Univ. of Texas at Arlington
Program Committee: Mu Chiao, The Univ. of
British Columbia (Canada); Debabani Choudhury, HRL
Labs., LLC; Eric Donzier, Schlumberger Cambridge
Research (United Kingdom); Sanjay Krishna, The Univ. of
New Mexico; Tamal Mukherjee, Carnegie Mellon Univ.;
Jeongsik Sin, The Univ. of Texas at Arlington;
Yu-Chuan Su, National Tsing Hua Univ. (Taiwan);
Kazuyoshi Tsuchiya, Tokai Univ. (Japan); T. C.
Yih, The Univ. of Texas at San Antonio
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Monday 22 January
MOEMS-MEMS Plenary Presentation
9:00 am to 12:00 pm
| 9:00 to 9:10 |
Welcome and opening remarks |
| 9:10 to 10:00 |
The unique challenges in fabricating micro- and
nanophotonic structures
Henry I. Smith,
Massachusetts Institute of Technology |
| 10:00 to 10:20 |
Coffee break |
| 10:20 to 11:10 |
MEMS & OPTICS: A Happy Marriage
Richard S.
Payne, Pixtronix, Inc. |
| 11:10 to Noon |
MEMS for medical technology applications
Göran
Stemme, Royal Institute of Technology
(Sweden) | |
SESSION 1 Mon. 1:00 to 2:20 pm
Lasers
Pulse-width dependency of the fabricating resolution of the
two-photon absorption photo-polymerization, H. J. Kong, S. W.
Yi, D. Yang, Korea Advanced Institute of Science and Technology
(South Korea); K. Lee, Hannam Univ. (South Korea); J. Kim, T. Lim,
S. Kim, Korea Advanced Institute of Science and Technology (South
Korea) [6462A-01]
Small-scaled and microfeatured functional prototypes by laser
sintered polyetheretherketone, T. Rechtenwald, Bayerisches
Laserzentrum GmbH (Germany); D. Phole, Univ. of Erlangen (Germany);
M. H. M. Schmidt, Bayerisches Laserzentrum GmbH (Germany) [6462A-02]
Characterization of femtosecond laser ablation and deposition
through spectral interferometry, S. Bera, A. J. Sabbah, J. M.
Yarbrough, C. G. Allen, B. Winters, C. G. Durfee, J. A. Squier,
Colorado School of Mines [6462A-03]
Increasing femtosecond laser processing efficiency by
hybridization with nanosecond laser, J. S. Yahng, B. H. Chon, C.
H. Kim, Korea Research Institute of Standards and Science (South
Korea); H. R. Kim, Bicronix Co., Ltd. (South Korea); S. C. Jeoung,
Korea Research Institute of Standards and Science (South Korea)
[6462A-04]
SESSION 2 Mon. 2:20 to 4:50 pm
High Aspect Ratio Devices and Etching Techniques
Microfabricated 3D polymeric structure with SU-8, S. W.
Yi, H. J. Kong, Korea Advanced Institute of Science and Technology
(South Korea) [6462A-05]
A new UV-lithography photoresist for fabrication of
high-aspect-ratio microstructures, R. Yang, S. A. Soper, W.
Wang, Louisiana State Univ. [6462A-06]
Plasma etching of positively sloped silicon structures, S.
Lai, K. D. Mackenzie, D. J. Johnson, R. J. Westerman, Oerlikon USA
Inc. [6462A-07]
The silicon mold fabrication of a kind of micro-optical
resonator and coupler, H. Ju, Wakayama Univ. (Japan) [6462A-08]
Processing parameters for the development of glass/ceramic
MEMS, J. A. Stillman, Univ. of California/Los Angeles and The
Aerospace Corp.; J. W. Judy, Univ. of California/Los Angeles; H.
Helvajian, The Aerospace Corp. [6462A-09]
Use of silane-based primer on silicon wafers to enhance
adhesion of edge-protective coatings during wet etching: application
of TALON(TM) wrap process, J. Dalvi-Malhotra, G. Brand, X.
Zhong, Brewer Science, Inc. [6462A-10]
SESSION 3 Mon. 4:50 to 5:50 pm
Devices
New emerging MEMS applications, E. Mounier, Yole
Dévelopment (France) [6462A-11]
Design of high-sensitive acoustic sensor using PMN-PT single
crystal, S. Q. Lee, H. Kim, K. H. Park, Electronics and
Telecommunications Research Institute (South Korea); K. S. Moon, Y.
K. Hong, San Diego Stage Univ. [6462A-12]
Fabrication technology of Si microfluidic devices for
microbial cell trapping, R. M. Badam, R. Nagarajan, L. Zhu, C.
Y. Teo, X. Peh, H. Feng, N. Balasubramanian, W. Liu, Institute of
Microelectronics (Singapore) [6462A-13]
Posters - Wednesday
All symposium attendees are invited to attend the poster
sessions provided as an opportunity to enjoy refreshments while
reviewing poster papers. Each evening will represent a different set
of conferences to promote opportunities for networking with
colleagues in your field. Attendees are encouraged to review the
high-quality papers that are presented in this alternate format and
to interact with the poster authors. Attendees are requested to wear
their conference registration badges to the poster sessions.
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Poster presenters may post their poster papers Wednesday
morning starting at 10:00 am in the Parkside Hall, and will
need to remove their papers immediately following the poster
session that evening. Poster authors should be at their papers
from 6:00 pm to 7:30 pm to answer questions from
attendees. |
- Theoretical and experimental studies of a condenser-type
miniature microphone with a flexure hinge diaphragm, H. Kim,
S. Q. Lee, K. H. Park, Electronics and Telecommunications Research
Institute (South Korea) [6462A-14]
- Verification of thin film processes in a virtual
fabrication environment, T. Schmidt, Univ. Siegen (Germany);
D. Ortloff, Cavendish Kinetics B.V. (Netherlands); K. Hahn, R.
Brueck, Univ. Siegen (Germany); A. Hoessinger, SILVACO Technology
Ctr. (United Kingdom) [6462A-16]
- Replication technology as a means of implementing the
polymer MOEMS, J. Kim, J. J. Ju, S. Park, S. K. Park, M. Kim,
M. Lee, Electronics and Telecommunications Research Institute
(South Korea) [6462A-15]
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