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CHA Electron-Beam Evaporator

The e-beam evaporator is used to coat samples with various metals. Unlike sputtered films, evaporators only coat the surface facing away from the substrate. -Typical deposition rates range from <1 angstroms/sec to 3 angstroms/sec.


* Four-hearth rotating e-gun source

* Cryopump

* Quartz-crystal thickness monitors

* Two shutters – source and substrate

* Liquid heating or cooling option for substrate

* In-chamber bake-out lamps

* Water-cooled chamber