The e-beam evaporator is used to coat samples with various metals. Unlike sputtered films, evaporators only coat the surface facing away from the substrate. -Typical deposition rates range from <1 angstroms/sec to 3 angstroms/sec.
* Four-hearth rotating e-gun source
* Quartz-crystal thickness monitors
* Two shutters – source and substrate
* Liquid heating or cooling option for substrate
* In-chamber bake-out lamps
* Water-cooled chamber